XPS – X-ray Photoelectron Spectroscopy
Surface-Sensitive Chemical Analysis for Thin Films and Advanced Materials
X-ray Photoelectron Spectroscopy (XPS) is a powerful surface analysis technique used to determine elemental composition, chemical states, and electronic structure within the top few nanometers of a material. At JP Analytical, XPS provides precise insight into surface chemistry, interface quality, contamination, and oxidation — critical factors influencing thin-film performance and device reliability.
Our XPS services support semiconductor research, advanced coatings, and emerging materials development by delivering quantitative surface information that complements bulk-sensitive techniques such as ion beam analysis. By combining high-resolution spectra with careful data interpretation, we help researchers understand how processing steps, thermal treatments, and defect passivation strategies impact surface composition and bonding.
Key Capabilities
Cluster-ion-sputtering-based depth profiling
Elemental composition and chemical state identification
Thin-film surface and interface analysis
Oxide and contamination evaluation
Depth profiling of multilayer structures
Failure analysis and process optimization support
Applications
Semiconductor and ALD-grown thin films
Advanced device materials and interfaces
Hydrogenation and defect passivation studies
Corrosion and surface modification analysis
Quality control and R&D characterization
At JP Analytical, XPS is integrated with complementary metrology methods to provide a comprehensive understanding of materials — from surface chemistry to bulk composition — enabling confident decisions throughout product development and manufacturing.
